| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a laser irradiating device capable of performing efficient, uniform annealing by using a simple optical system and laser beams having an attenuation region, to provide a laser irradiation method using such laser irradiating device, and to provide a method for manufacturing a semiconductor device including the laser irradiation method in a process. <P>SOLUTION: The laser irradiation device comprises a plurality of lasers, a means for composing a plurality of laser beams emitted from the plurality of lasers into one laser beam on a stage, and a means for moving the composed laser beams while a shape is being maintained on the stage. Then, a semiconductor film is irradiated with the laser beams by using such a laser irradiating device to crystallize the semiconductor film or activate impurity elements. <P>COPYRIGHT: (C)2004,JPO</p> |
