发明名称 INSPECTING METHOD AND INSPECTING APPARATUS
摘要 PROBLEM TO BE SOLVED: To efficiently separate a signal from a pattern from a signal from a defect, in a technology of inspecting a micro circuit pattern using an image formed by irradiating with a white light, a laser beam, or an electronic beam. SOLUTION: In this inspecting apparatus 91 of a semiconductor device, a space filter on which a Fourier transformation image of a circuit pattern on an inspected object is printed is disposed in a detection optical system 200, and a diffracted light of the circuit pattern existing on the inspected object is shielded selectively. Using the space filter on which the Fourier transformation image of the pattern on a wafer 1 is printed, a foreign matter and a defect can be detected with high accuracy and high sensitivity. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004177377(A) 申请公布日期 2004.06.24
申请号 JP20020347134 申请日期 2002.11.29
申请人 HITACHI LTD;HITACHI ELECTRONICS ENG CO LTD 发明人 HAMAMATSU REI;NOGUCHI MINORU;NISHIYAMA HIDETOSHI;OSHIMA YOSHIMASA;JINGU TAKAHIRO;UTO YUKIO
分类号 G01B11/30;G01N21/88;G01N21/94;G01N21/95;G01N21/956;H01L21/66;(IPC1-7):G01N21/956 主分类号 G01B11/30
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