| 发明名称 |
Structures providing low absorbing polymers at 157 nm wavelengths |
| 摘要 |
Monomers containing two or more hexafluoroisopropyl groups and containing plural saturated rings are polymerized to form polymers of high transparency optical properties at 157 nm wavelengths and improved etch resistance compared to polymers formed from single ring monomers.
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| 申请公布号 |
US2004122179(A1) |
申请公布日期 |
2004.06.24 |
| 申请号 |
US20020327652 |
申请日期 |
2002.12.24 |
| 申请人 |
OBER CHRISTOPHER K;VOHRA VAISHALI R |
发明人 |
OBER CHRISTOPHER K;VOHRA VAISHALI R |
| 分类号 |
C08F20/30;C08F214/16;C08F290/04;C08F290/06;(IPC1-7):C08F259/00 |
主分类号 |
C08F20/30 |
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代理人 |
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