发明名称 |
METHOD FOR CO-FABRICATING STRAINED AND RELAXED CRYSTALLINE AND POLY-CRYSTALLINE STRUCTURES |
摘要 |
One embodiment of the present invention provides a system for co fabricating strained and relaxed crystalline, poly-crystalline, and amorphous structures in an integrated circuit device using common fabrication steps. The system operates by first receiving a substrate. The system then fabricates multiple layers on this substrate. A layer within these multiple layers includes both strained structures and relaxed structures. These strained structures and relaxed structures are fabricated simultaneously using common fabrication steps. |
申请公布号 |
WO03098664(A3) |
申请公布日期 |
2004.06.24 |
申请号 |
WO2003US15598 |
申请日期 |
2003.05.15 |
申请人 |
THE REGENTS OF THE UNIVERSITY OF CALIFORNIA |
发明人 |
PETERSON, JEFFREY;HUNT, CHARLES |
分类号 |
H01L21/20;H01L21/268 |
主分类号 |
H01L21/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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