发明名称 Target and manufacturing method thereof
摘要 A sputtering target is provided, including a target material and a backing plate that are bonded with a strong adhesion at a reduced cost. The method for bonding the target material and the backing plate does not use a special soldering material, and is therefore cheaper and more reliable. The target includes an inorganic target material and a backing plate that are bonded with a soldering material between them. At least one of the target material and the backing plate is coated with a coupling agent of a semi-metal oxide or a metal oxide.
申请公布号 US2004118679(A1) 申请公布日期 2004.06.24
申请号 US20030626237 申请日期 2003.07.23
申请人 TANIGUCHI SHIGERU;IWASAKI KATSUNORI 发明人 TANIGUCHI SHIGERU;IWASAKI KATSUNORI
分类号 B23K1/00;B23K35/00;B23K35/26;C23C14/34;(IPC1-7):C23C14/34;B23K20/18;B23K1/20;B23K31/02 主分类号 B23K1/00
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