发明名称 |
Deposition reactor with precursor recycle |
摘要 |
A reactor vessel is provided with a solvent in a supercritical PVT state for use in depositing films on a deposition substrate. A metal organic precursor is dissolved in the supercritical solvent, as is a reaction agent. A chemical reaction deposits a film, such as a metal film on a semiconducting wafer, and reaction byproducts including a ligand ensue from the chemical reaction. Effluent from the reactor vessel is submitted to a precursor-forming agent that reacts with the ligand to rejuvenate the precursor. Alternatively, the precursor-forming agent can be used for point-of-use formation of the precursor with or without recycle of reaction byproducts.
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申请公布号 |
US2004120870(A1) |
申请公布日期 |
2004.06.24 |
申请号 |
US20020329251 |
申请日期 |
2002.12.23 |
申请人 |
BLACKBURN JASON;DALTON JEREMIE |
发明人 |
BLACKBURN JASON;DALTON JEREMIE |
分类号 |
B01J3/00;(IPC1-7):B01J10/00;B01J8/04 |
主分类号 |
B01J3/00 |
代理机构 |
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代理人 |
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