| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a liquid composition for etching a metallic thin film pattern consisting essentially of silver with high precision and forming an excellent pattern shape, and also having excellent practicability. <P>SOLUTION: The liquid composition for etching a metallic thin film consisting essentially of silver is obtained by blending, by weight, 40 to 50% phosphoric acid, 1.5 to 3.5% nitric acid, 25 to 40% acetic acid, and water. <P>COPYRIGHT: (C)2004,JPO |
