发明名称 |
Isolated micro pressure sensor and method for making the same |
摘要 |
A method for producing an isolated micro pressure sensor and the process for producing the same are disclosed. The method for manufacturing the isolated micro pressure sensor includes: (A) etching one surface of a substrate to form a rampart with an open cavity on the center of its top surface and with plate portions surrounding the rampart; (B) forming a plurality of first contact pads on said plate portions of the substrate outside said rampart; (C) forming a plurality of second contact pads, a plurality of piezo-resistors, thermo sensors, temperature-controlling elements and circuit patterns on a bulk silicon wafer; (D) forming a plurality of grooves on the periphery of the bulk silicon wafer; (E) bonding the bulk silicon wafer and the substrate; and (F) thinning said bulk silicon wafer until said bulk silicon wafer forming a thin membrane.
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申请公布号 |
US2004118213(A1) |
申请公布日期 |
2004.06.24 |
申请号 |
US20020325868 |
申请日期 |
2002.12.23 |
申请人 |
INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE |
发明人 |
OU YEONG-JEONG;SHING TAIKANG;CLARK JUSTIN;YANG KE-SHIENG;CHUNG JENG-SHIE |
分类号 |
G01L9/00;G01L27/00;(IPC1-7):G01L9/00 |
主分类号 |
G01L9/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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