Substrate processing apparatus used in manufacture of e.g. semiconductor wafer, has gas circulating tube extended outside substrate transfer chamber and connected to corresponding portions of substrate transfer chamber

摘要

A contamination controlling system (130) has a gas inlet port (132) connected to a substrate transfer chamber and through which purging gas is supplied into the substrate transfer chamber. A gas circulating tube (138), extended outside the substrate transfer chamber (110), is connected to corresponding portions of the substrate transfer chamber to recirculate purged gas through the substrate transfer chamber. An independent claim is included for a substrate processing method.