发明名称 APPARATUS AND METHOD FOR QUANTATIVELY MEASURING LIQUID FILM DRYING RATES ON SUBSTRATES
摘要 An apparatus and method for measuring the drying rate of a liquid or liquid film in air or other gaseous media by either: a) measuring changes in the print density of the liquid; b) measuring changes in the dynamic surface tension of the liquid; c) measuring the differential pressure between an inert gas required to displace a sample of the liquid drawn into a capillary tube from a reservoir of the liquid and the pressure required for a bubble of the gas to form in the reservoir; and d) measuring the electrical conductance or resistance of the liquid.
申请公布号 WO2004015379(A3) 申请公布日期 2004.06.24
申请号 WO2003US25137 申请日期 2003.08.08
申请人 SUN CHEMICAL CORPORATION;SPRYCHA, RYSZARD;SMITH, DOREEN, E.;BIRO, DAVID;PARRIS, JUANITA;LAKSIN, MIKHAIL;PACE, GREGORY 发明人 SPRYCHA, RYSZARD;SMITH, DOREEN, E.;BIRO, DAVID;PARRIS, JUANITA;LAKSIN, MIKHAIL;PACE, GREGORY
分类号 G01N33/32 主分类号 G01N33/32
代理机构 代理人
主权项
地址
您可能感兴趣的专利