FLUORORESIN COMPOSITION, PROCESS FOR PRODUCING THE SAME, SEMICONDUCTOR PRODUCING APPARATUS AND COATED WIRE

摘要

A member of semiconductor producing apparatus that excels in ozone resistance and surface smoothness; and a fluororesin composition comprising a tetrafluoroethylene/fluoroalkoxytrifluoroethylene copolymer, which fluororesin composition excels in moldability. In particular, a fluororesin composition comprising a tetrafluoroethylene/fluoroalkoxytrifluoroethylene copolymer and a tetrafluoroethylene/hexafluoropropylene copolymer, characterized in that the tetrafluoroethylene/hexafluoropropylene copolymer is used in an amount of 0.5 to 60 mass% based on the total solid mass of tetrafluoroethylene/hexafluoropropylene copolymer and tetrafluoroethylene/fluoroalkoxytrifluoroethylene copolymer, and that a measuring tube molding from the fluororesin composition with respect to its inside surface has an average roughness [Ra] of 0.035 mum or less and a maximum roughness [Rt] of 0.3 mum or less.