| 发明名称 |
Method of fabricating an optical element, lithographic apparatus and device manufacturing method |
| 摘要 |
A fabrication technique for manufacturing an optical element is disclosed. It involves selectively plasma etching a multi-layer stack and covering the obtained relief profile with a film, for example a reflective coating.
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| 申请公布号 |
US2004120458(A1) |
申请公布日期 |
2004.06.24 |
| 申请号 |
US20030719009 |
申请日期 |
2003.11.24 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
DIERICHS MARCEL MATHIJS THEODORE MARIE;LOOPSTRA ERIK ROELOF |
| 分类号 |
G03F7/11;G02B5/18;G03F1/14;G03F7/00;G03F7/20;G03F7/40;G21K1/06;H01L21/027;(IPC1-7):H05G1/70 |
主分类号 |
G03F7/11 |
| 代理机构 |
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