发明名称 Test pattern, inspection method, and device manufacturing method
摘要 A method according to one embodiment of the invention may be applied to enhance scatterometry measurements made from a two-component test pattern. Reference patterns corresponding to each of the components of the two-component pattern are also printed. Scatterometry signals derived from the reference patterns, corresponding to the separate components of the test pattern, are used to enhance the signal from the test pattern to improve sensitivity and signal-to-noise ratios.
申请公布号 US2004119970(A1) 申请公布日期 2004.06.24
申请号 US20030696726 申请日期 2003.10.30
申请人 DUSA MIRCEA;BOEF ARIE JEFFREY DEN 发明人 DUSA MIRCEA;BOEF ARIE JEFFREY DEN
分类号 G03F1/08;G03F7/20;G03F9/00;H01L21/027;(IPC1-7):G01N21/88 主分类号 G03F1/08
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