发明名称 Method of fabricating array substrate having color filter on thin film transistor structure
摘要 A method of forming an array substrate for use in a liquid crystal display device includes forming a gate line, a gate pad, and a gate electrode, forming a first gate insulating layer to cover the gate line, the gate pad, and the gate electrode, forming an active layer and an ohmic contact layer on the first gate insulating layer, forming a data line, a data pad, a source electrode, and a drain electrode, forming a second insulating layer to cover the thin film transistor, forming a black matrix on the second insulating layer to cover the thin film transistor, the gate line, and the data line except a first portion of the drain electrode, forming a third insulating layer to cover the black matrix, patterning the first, second, and third insulating layers, forming a first transparent electrode layer to cover the patterned third insulating layer, coating an adhesive color film on the first transparent electrode layer, irradiating a laser to portions of the adhesive color film corresponding to the pixel region, removing the adhesive color film to form a color film, repeating coating the adhesive color film, irradiating the laser and removing the adhesive color film to form the color film within all of the pixel regions, forming a second transparent electrode to cover the color filter and the first transparent electrode layer, and patterning the first and second transparent electrode layers to form first and second pixel electrodes, a double-layered gate pad terminal, and a double-layered data pad terminal.
申请公布号 US2004119903(A1) 申请公布日期 2004.06.24
申请号 US20030728835 申请日期 2003.12.08
申请人 LG.PHILIPS LCD CO., LTD. 发明人 CHANG YOUN-GYOUNG;PARK SEUNG-RYULL
分类号 G02F1/1335;G02F1/1362;(IPC1-7):G02F1/136 主分类号 G02F1/1335
代理机构 代理人
主权项
地址