发明名称 PLATING BATH COMPOSITION CONTROL
摘要 A method of plating bath composition control. The method may include analysis of a plating bath to determine byproduct concentrations and changing the composition of the plating bath as a result thereof. Additionally, plating bath solution may be circulated between reservoirs before, during, or after the analysis and the changing of the composition. Methods may be carried out with use of a system having separate reservoirs, an analyzer, and a dosing controller for the changing of the composition.
申请公布号 WO2004053455(A2) 申请公布日期 2004.06.24
申请号 WO2003US37718 申请日期 2003.11.25
申请人 ADVANCED TECHNOLOGY MATERIALS, INC. 发明人 TALASEK, ROBERT;VAN DEN BERG, MARC;RYANN, WILLIAM, F.
分类号 C23C18/16;C25D7/12;C25D21/12 主分类号 C23C18/16
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