发明名称 METHOD FOR MANUFACTURING OPTICAL ELEMENT, LITHOGRAPHIC APPARATUS, AND DEVICE MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a manufacturing technique for manufacturing an optical element having a relief profile with which a reflective film can surely be deposited on a multilayered stack. <P>SOLUTION: In this manufacturing technique, the relief profile is formed by selectively applying a plasma etching to a multilayered stack including alternative layers of a first material and a second material, which have relative etching selectivity. The relief profile is coated with the film such as a reflective coating film. <P>COPYRIGHT: (C)2004,JPO
申请公布号 JP2004177956(A) 申请公布日期 2004.06.24
申请号 JP20030393923 申请日期 2003.11.25
申请人 ASML NETHERLANDS BV 发明人 DIERICHS MARCEL MATHIJS THEODORE MARIE;LOOPSTRA ERIK ROELOF
分类号 G03F7/11;G02B5/18;G03F1/24;G03F7/00;G03F7/20;G03F7/40;G21K1/06;H01L21/027 主分类号 G03F7/11
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