发明名称 |
METHOD FOR MANUFACTURING OPTICAL ELEMENT, LITHOGRAPHIC APPARATUS, AND DEVICE MANUFACTURING METHOD |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a manufacturing technique for manufacturing an optical element having a relief profile with which a reflective film can surely be deposited on a multilayered stack. <P>SOLUTION: In this manufacturing technique, the relief profile is formed by selectively applying a plasma etching to a multilayered stack including alternative layers of a first material and a second material, which have relative etching selectivity. The relief profile is coated with the film such as a reflective coating film. <P>COPYRIGHT: (C)2004,JPO |
申请公布号 |
JP2004177956(A) |
申请公布日期 |
2004.06.24 |
申请号 |
JP20030393923 |
申请日期 |
2003.11.25 |
申请人 |
ASML NETHERLANDS BV |
发明人 |
DIERICHS MARCEL MATHIJS THEODORE MARIE;LOOPSTRA ERIK ROELOF |
分类号 |
G03F7/11;G02B5/18;G03F1/24;G03F7/00;G03F7/20;G03F7/40;G21K1/06;H01L21/027 |
主分类号 |
G03F7/11 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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