OPTICAL DEVICE AND PROJECTION EXPOSURE APPARATUS USING SUCH OPTICAL DEVICE

摘要

An immersion exposure apparatus comprises a projection optical system (PL) for projecting an image of a pattern onto a substrate (W) and a unit (5) for supplying a liquid (7) between an optical device (4) at the end of the projection optical system (PL) and the substrate (W). An erosion-resistant film composed of an oxide is formed over the surface of the optical device (4) so as to prevent erosion by the liquid (7). Consequently, a desired performance of the projection optical system can be secured for a long time even where a block exposure in a step-and-repeat system or a scanning exposure in a step-and-scan system is performed in an immersion state.