| 摘要 |
PURPOSE: A plasma etching apparatus is provided to carry out the periodical spin process for a quartz pipe without dissolving the vacuum state of the quartz pipe and a process chamber by using the first and second valve. CONSTITUTION: A plasma etching apparatus is provided with a process chamber, a quartz pipe(405) for guiding plasma to the process chamber, a connection pipe(420) connected with the quartz pipe through its one end portion, and the first valve(411) installed at the other end portion of the connection pipe controls the vacuum state of the quartz pipe. The plasma etching apparatus further includes a gas inlet pipe(404) connected with the connection pipe through its one end portion, the second valve(412) installed at the other end portion of the gas inlet pipe controls supply gas, and an exhaust port(413) between the first and second valve.
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