发明名称 X-ray optical system for small angle scattering measurements
摘要 An X-ray optical system for small angle scattering has a parabolic multilayer mirror (24) and, so that switching to other X-ray incident optical systems for X-ray analysis can be easily performed. A parabolic multilayer mirror (24), an optical-path selecting slit device (26), a small-angle selecting slit device (28) and a Soller slit (30) are arranged between an X-ray source (22) and a specimen-side slit (23). An X-ray beam having passed through the first aperture (34) of an aperture slit plate (32) is interrupted by the optical-path selecting slit (26). An X-ray beam having passed through the second aperture (36) of the aperture slit plate (32) is reflected at the reflecting surface (38) of the multilayer mirror (24) to become a parallel beam (40). This parallel beam (40) passes through an aperture (42) of the optical-path selecting slit device (26). The beam width is restricted by a narrow slit (48) of the small-angle selecting slit device (28). <IMAGE>
申请公布号 EP1396716(A3) 申请公布日期 2004.06.23
申请号 EP20030019565 申请日期 2003.09.02
申请人 RIGAKU CORPORATION 发明人 FUJINAWA, GO;OKANDA, HITOSHI
分类号 G01N23/201 主分类号 G01N23/201
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