发明名称 |
POSITIVE PHOTOSENSITIVE POLYIMIDE RESIN COMPOSITION |
摘要 |
The invention provides a positive photosensitive resin composition which is free from film reduction, swelling or peeling at the time of development with an aqueous alkaline solution and which provides a dimensionally stable patterns after curing, and of which the final cured film has a low water absorption and excellent alkaline resistance. A positive photosensitive polyimide resin composition characterized by comprising an organic solvent-soluble polyimide having repeating units represented by the formula (1): <CHEM> (wherein m is an integer of from 3 to 10,000, R<1> is a tetravalent organic group, R<2> is a bivalent organic group, provided that from 5 to 100 mol% of R<2> is a bivalent organic group having fluorine), a polyamic acid and a compound capable of generating an acid by irradiation with light.
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申请公布号 |
EP1431822(A1) |
申请公布日期 |
2004.06.23 |
申请号 |
EP20020767966 |
申请日期 |
2002.09.18 |
申请人 |
NISSAN CHEMICAL INDUSTRIES, LTD. |
发明人 |
NAKAYAMA, TOMONARI;KATO, MASAKAZU;NIHIRA, TAKAYASU |
分类号 |
C08L79/08;G03F7/023;(IPC1-7):C08G73/10;C08G73/12;G03F7/022;G03F7/037;H01L21/027 |
主分类号 |
C08L79/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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