METHOD FOR FABRICATING FBAR DEVICE USING MEMS METHOD

摘要

PURPOSE: A method for fabricating an FBAR device using a MEMS method is provided to improve preferred orientation and preferred crystallization of a piezoelectric layer by growing directly the piezoelectric layer on a single crystalline substrate. CONSTITUTION: A piezoelectric layer is formed on an upper surface of a substrate(1). A photoresist is coated on an upper part of the piezoelectric layer. A pattern is formed on the photoresist. The patterned piezoelectric layer is etched. The photoresist is removed from the substrate. The photoresist coated on a rear surface of the substrate. The photoresist is patterned. An anisotropic etching process for the rear surface of the substrate is performed by using the pattern of the photoresist. A via hole is formed thereon. An electrode(10) is formed on the upper part and a lower part of the piezoelectric layer.