APPARATUS AND METHOD FOR DEVELOPING PHOTORESIST LAYER

摘要

PURPOSE: An apparatus and method for developing a photoresist layer are provided to effectively remove the residues of the photoresist layer by installing a micro foam generation part at one side of an inflow line for a developer. CONSTITUTION: An apparatus for developing a photoresist layer is provided with an inflow line(311) for supplying a developer, a micro foam generation part(313) at one side of the inflow line for generating micro foams in the developer, and a plurality of nozzles(312) at one end portion of the inflow line for jetting the developer on a wafer(302). The wafer is stably loaded on a chuck(301). An ultrasonic wave generator is used as the micro foam generation part.