发明名称 Probe finger structure and method for making a probe finger structure
摘要 <p>A method for making a probe finger structure (14) including the steps of providing a wafer or wafer portion having an upper layer (32), a lower layer (30) and an insulating or etch stop layer (34) located between the upper and lower layers. The method further includes the step of etching the lower layer to form a mounting portion, and etching the upper layer to form a plurality of probe fingers. The method also includes the step of locating an electrically conductive material (40) on each of the probe fingers. <IMAGE></p>
申请公布号 EP1431241(A2) 申请公布日期 2004.06.23
申请号 EP20030104568 申请日期 2003.12.05
申请人 ROSEMOUNT AEROSPACE INC. 发明人 KOCH, DANIEL, J;KEENAN, DAVID, R;GEPHART, GREG, L
分类号 B81B3/00;G01Q70/06;G01R1/073;G01R3/00;(IPC1-7):B81B3/00;G12B21/02 主分类号 B81B3/00
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