发明名称 COMPOUNDS FOR PHOTORESIST AND RESIN COMPOSITION FOR PHOTORESIST
摘要 A photoresist adamantane-series monomer represented by the following formula (1b): €ƒ€ƒ€ƒ wherein R 11 represents a hydrogen atom or a methyl group; R 12 , R 13 , and R 14 are the same or different from each other, each representing a hydrogen atom, an alkyl group, or a hydroxyl group and at least one of the substituents R 12 to R 14 is a hydroxyl group; X represents a connecting group; and m and n individually represent 0 or 1.
申请公布号 KR20040053335(A) 申请公布日期 2004.06.23
申请号 KR20047007599 申请日期 1999.05.20
申请人 发明人
分类号 G03F7/039;C07C69/54;C07C69/753;C07C69/757;G03F7/004;H01L21/30 主分类号 G03F7/039
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