A polymer solution for nanoprint lithography to reduce imprint temperature and pressure,申请号AU20030293107-传众专利搜索

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发明名称	A polymer solution for nanoprint lithography to reduce imprint temperature and pressure
摘要
申请公布号	AU2003293107(A8)	申请公布日期	2004.06.23
申请号	AU20030293107	申请日期	2003.11.26
申请人	HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P.	发明人	GUN-YOUNG JUNG;YONG CHEN;R STANLEY WILLIAMS;GANAPATHIAPPAN SIVAPACKIA
分类号	B29C35/08;B29C59/02;G03F7/00;G03F7/033;(IPC1-7):G03F7/00	主分类号	B29C35/08
代理机构		代理人
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地址

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