发明名称 Projection optical system, projection apparatus and projection exposure method
摘要 A dioptric projection optical system which projects an image of a first surface onto a second surface, comprising: a lens component formed of at least two types of fluorides, wherein a first lens group having a negative refractive power and arranged in an optical path between the first surface and the second surface, a second lens group having a positive refractive power and arranged in an optical path between the first lens group and the second surface, a third lens group having a negative refractive power and arranged in an optical path between the second lens group and the second surface, a fourth lens group having an aperture stop and arranged in an optical path between the third lens group and the second surface, and a fifth lens group having a positive refractive power and arranged in an optical path between the fourth lens group and the second surface, a clear aperture of a light beam in the projection optical system is at a relative maximum within the second lens group, at a minimum within the third lens group, and at relative maximum within the third, fourth, or fifth lens group, and has only one significant minimum between the first surface and the second surface. <IMAGE>
申请公布号 EP1235092(A3) 申请公布日期 2004.06.23
申请号 EP20020003276 申请日期 2002.02.22
申请人 NIKON CORPORATION 发明人 OMURA, YASUHIRO
分类号 G02B13/24;G02B13/14;G03F7/20;H01L21/027 主分类号 G02B13/24
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