发明名称 ACID-SENSITIVE COMPOUND AND RESIN COMPOSITION FOR PHOTORESIST
摘要 A photoresist copolymer comprising a monomer unit corresponding to a monomer represented by the following formula (11a) or (12a): <CHEM> wherein R<1> and R<2> are the same or different and each represents a C1-4alkyl group, and R<3> represents a hydrogen atom or methyl group; and a lactone ring-containing monomer unit.
申请公布号 KR20040053351(A) 申请公布日期 2004.06.23
申请号 KR20047007682 申请日期 1999.05.20
申请人 发明人
分类号 G03F7/039;C07C69/00;C07C69/54;G03F7/004 主分类号 G03F7/039
代理机构 代理人
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