发明名称 A FIELD-EFFECT TRANSISTOR
摘要 A field-effect transistor is made with electrodes (2, 4, 5) and isolators (3 ) in vertically provided layers, such that at least the electrodes (4, 5) and the isolators (3) form a step (6) oriented vertically relative to the first electrode (2) or the substrate (1). Implemented as a junction field-effect transistor (JFET) or a metal-oxide semiconducting field-effect transistor (MOSFET) the electrodes (2, 5) forming respectively the drain and source electrode of the field-effect transistor or vice versa and the electrode (4) the gate electrode of the field-effect transistor. Over the layers in the vertical step (6) an amorphous, polycrystalline or microcrystalline inorganic or organic semiconductor material is provided and forms the active semiconductor of the transistor contacting the gate electrode (8) directly or indirectly and forming a vertically oriented transistor channel (9) of the p or n type between the first (2) and the second (5) electrode. In a method for fabrication of a field effect transistor a vertical step (6) is formed by a means of a photolithographic process and a soluble amorphous active semiconductor material (8) is deposited over the first electrode (2) and the vertical step (6) such that a vertically oriented transistor channel between the drain and source electrode (2, 5) is obtained. In a JFET the semiconduct or material (8) contacts the gate electrode (4) directly. In a MOSFET a vertically oriented gate isolator (7) is provided between the gate electrode (4) and the semiconductor material (8).
申请公布号 CA2317759(C) 申请公布日期 2004.06.22
申请号 CA19992317759 申请日期 1999.01.14
申请人 THIN FILM ELECTRONICS ASA 发明人 KARLSSON, JOHAN ROGER AXEL;BERGGREN, ROLF MAGNUS;GUSTAFSSON, BENGT GORAN
分类号 H01L29/772;H01L21/335;H01L21/336;H01L21/337;H01L21/338;H01L29/78;H01L29/786;H01L29/80;H01L29/808;H01L51/10;(IPC1-7):H01L29/772 主分类号 H01L29/772
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