发明名称 Automated electrode replacement apparatus for a plasma processing system
摘要 A plasma processing system includes an automated electrode retention mechanism (130) for providing automated engagement of a source electrode (152) with a drive electrode (154). In addition, an automated electrode handling system (320) is provided that has the ability to remove a source electrode (152) from the electrode retention mechanism and replace it with a second source electrode (152') that is stored in a staging area (340) outside the plasma processing system vacuum chamber. The system may operate automatically under program control of a computer system (200) coupled thereto.
申请公布号 US6753498(B2) 申请公布日期 2004.06.22
申请号 US20030346186 申请日期 2003.01.17
申请人 TOKYO ELECTRON LIMITED 发明人 SIRKIS MURRAY D.;STRANG ERIC;BIBBY YU WANG;CRONIN JOHN E.
分类号 H01J37/32;(IPC1-7):B23K10/00 主分类号 H01J37/32
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