发明名称 |
Automated electrode replacement apparatus for a plasma processing system |
摘要 |
A plasma processing system includes an automated electrode retention mechanism (130) for providing automated engagement of a source electrode (152) with a drive electrode (154). In addition, an automated electrode handling system (320) is provided that has the ability to remove a source electrode (152) from the electrode retention mechanism and replace it with a second source electrode (152') that is stored in a staging area (340) outside the plasma processing system vacuum chamber. The system may operate automatically under program control of a computer system (200) coupled thereto.
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申请公布号 |
US6753498(B2) |
申请公布日期 |
2004.06.22 |
申请号 |
US20030346186 |
申请日期 |
2003.01.17 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
SIRKIS MURRAY D.;STRANG ERIC;BIBBY YU WANG;CRONIN JOHN E. |
分类号 |
H01J37/32;(IPC1-7):B23K10/00 |
主分类号 |
H01J37/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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