| 摘要 |
An X-ray exposure apparatus includes an X-ray source for generating pulsed X-rays, which are emitted radially, and first to nth exposure devices, disposed in a position facing the X-ray source and receiving the X-rays in an approximately perpendicular direction, and which use the received X-rays. The exposure devices project patterns of first to nth masks onto respective ones of first to nth substrates that are to be exposed.
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