发明名称 |
HEAT TRANSPORT DEVICE, METHOD FOR MANUFACTURING THE SAME AND ELECTRONIC DEVICE FOR REDUCING GAS GENERATION |
摘要 |
PURPOSE: A heat transport device, a method for manufacturing the same, and an electronic device are provided to prevent the occurrence of residual gas or reduce an amount of gas generation. CONSTITUTION: A silicon substrate(21A) is processed by dry-etching to form grooves or prominence and depression. Coating treatment is applied to a wall surface of a wick part or inner surface of a passage with ion implantation, thermal oxidation, or steam oxidation. The surface is polished by dry-etching or plasma treatment. Coating treatment is applied to the desired part of the surface by using a mask(22). A thin film is deposited on a glass substrate(21B). The silicon substrate is bonded to the glass substrate. |
申请公布号 |
KR20040051552(A) |
申请公布日期 |
2004.06.18 |
申请号 |
KR20030090138 |
申请日期 |
2003.12.11 |
申请人 |
SONY CORPORATION |
发明人 |
TONOSAKI MINEHIRO;OHMI MOTOSUKE;KATO EISAKU;YAJIMA MASAKAZU;YAJIMA TAKASHI |
分类号 |
F28D15/02;F28D15/04;H01L23/427;H05K7/20;(IPC1-7):F28D15/02 |
主分类号 |
F28D15/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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