OXIDE SINTERED COMPACT AND SPUTTERING TARGET, AND METHOD FOR MANUFACTURING OXIDE TRANSPARENT ELECTRODE FILM

摘要

PROBLEM TO BE SOLVED: To provide a sintered compact target which is a sintered compact target for manufacturing an oxide transparent electrode film having excellent light transmissivity not only in a visible light region but in an IR region as well and having a low resistance value, hardly gives rise to arcing in spite of application of high electric power in DC sputtering deposition using a power source not having an arcing suppression function, permits high-speed deposition accordingly, and does not gives rise to arcing in spite of application of the electric power for a long time.

SOLUTION: The sintered compact target mainly consists of indium oxide and titanium, in which the content of the titanium is 0.003 to 0.120 in Ti/In atomic ratio and the specific resistance is ≤1 kΩcm. Further, the specific resistance is preferably ≤1x10-2kΩcm. The content of the titanium is preferably 0.003 to 0.019 in Ti/In atomic ratio.

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