| 摘要 |
PROBLEM TO BE SOLVED: To provide a plasma chemical vapor deposition method and a plasma chemical vapor deposition system by pulse discharge which realize production of a thin film such as a diamond film having a high film deposition rate and satisfactory film quality or a DLC (diamond like carbon) film having satisfactory adhesiveness with a substrate. SOLUTION: In the plasma chemical vapor deposition method to a substrate by pulse discharge, a pulse power supply is used which is provided with: a DC power supply; an intelligent power module and a pulse transformer for interrupting the output the DC power supply; a high-voltage transformer; and a resistance and a diode for discharging a voltage from the high-voltage side of the high-voltage transformer, discharge by discharge electrodes consisting of a cathode and an anode and generating plasma from a gaseous starting material is formed into pulse, and the rising time of the pulse voltage from the transmission of the pulse by the pulse transmitter till the time at which the discharge voltage reaches the discharge starting voltage is controlled to≤20μs. Thus, stable pulse discharge is performed under a gas pressure equal to or below an atmospheric pressure. COPYRIGHT: (C)2004,JPO
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