| 摘要 |
The present invention relates to a method for producing a GMR structure in which a metallic multiple layer (12) is applied onto a carrier (10, 12, 30, 34) and in which the metallic multiple layer (14) is patterned to produce the GMR structure, the carrier (10, 12, 30, 34) having a structure before the metallic multiple layer is applied and the patterning of the metallic multiple layer is performed by CMP. The present invention also relates to a GMR structure having a carrier (10, 12, 30, 34) and a patterned metallic multiple layer positioned on the carrier (10, 12, 30, 34), the patterned metallic multiple layer (14) being situated in one or more depressions (50) of the carrier (10, 12, 30, 34). In addition, the present invention relates to a use of GMR structures.
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