发明名称 Grinding pad for wet-chemical grinding of a substrate surface comprises a polymer matrix consisting of polymers with repetition units and incorporating embedded abrasive particles
摘要 The grinding pad (8) for wet-chemical grinding of a substrate surface comprises a polymer matrix consisting of polymers with repetition units and incorporating embedded abrasive particles (9). The water solubility of the polymer matrix lies between 0.03 and 3 g/liter. An Independent claim is also included for a method for wet-chemical grinding of a substrate surface with use of the proposed grinding pad.
申请公布号 DE10255652(A1) 申请公布日期 2004.06.17
申请号 DE20021055652 申请日期 2002.11.28
申请人 INFINEON TECHNOLOGIES AG 发明人 GEYER, STEFAN
分类号 B24B37/00;B24D3/00;B24D3/28;B24D3/34;B24D7/18;B24D13/14;C08K3/22;C08K3/34;C08L101/00;H01L21/304;(IPC1-7):B24D13/00 主分类号 B24B37/00
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