发明名称 |
Grinding pad for wet-chemical grinding of a substrate surface comprises a polymer matrix consisting of polymers with repetition units and incorporating embedded abrasive particles |
摘要 |
The grinding pad (8) for wet-chemical grinding of a substrate surface comprises a polymer matrix consisting of polymers with repetition units and incorporating embedded abrasive particles (9). The water solubility of the polymer matrix lies between 0.03 and 3 g/liter. An Independent claim is also included for a method for wet-chemical grinding of a substrate surface with use of the proposed grinding pad.
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申请公布号 |
DE10255652(A1) |
申请公布日期 |
2004.06.17 |
申请号 |
DE20021055652 |
申请日期 |
2002.11.28 |
申请人 |
INFINEON TECHNOLOGIES AG |
发明人 |
GEYER, STEFAN |
分类号 |
B24B37/00;B24D3/00;B24D3/28;B24D3/34;B24D7/18;B24D13/14;C08K3/22;C08K3/34;C08L101/00;H01L21/304;(IPC1-7):B24D13/00 |
主分类号 |
B24B37/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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