| 摘要 |
PURPOSE: An electrooptic device is provided to perform an etching process while an entire outer surface, a girth of a substrate, and a cut surface are exposed when a protection layer is formed. CONSTITUTION: An etching process is performed in at least girth and on cut surfaces of the first substrate(10) and the second substrate(20), in order to remove scars from the first substrate(10) and the second substrate(20) while the first substrate(10) is contacted with the second substrate(20) by a sealing material(30). When the etching process is performed, at least a portion of exposed wiring surfaces of the first substrate(10) and the second substrate(20) is covered by a protection layer formed by avoiding at least the girth and the cut surfaces of the first and second substrates(10,20).
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