| 发明名称 |
RUTHENIUM COMPOUND AND PROCESS FOR PRODUCING METALLIC RUTHENIUM FILM |
| 摘要 |
<p>A ruthenium compound capable of forming filmy metallic ruthenium of good quality; and a process for producing a metallic ruthenium film which comprises using the ruthenium compound to produce the film by chemical vapor deposition. The ruthenium compound as a material for chemical vapor deposition is represented by, e.g., the following formula (1).</p> |
| 申请公布号 |
WO2004050947(A1) |
申请公布日期 |
2004.06.17 |
| 申请号 |
WO2003JP11848 |
申请日期 |
2003.09.17 |
| 申请人 |
JSR CORPORATION;SAKAI, TATSUYA;OKADA, SACHIKO;MATSUKI, YASUO |
发明人 |
SAKAI, TATSUYA;OKADA, SACHIKO;MATSUKI, YASUO |
| 分类号 |
C07C51/00;C23C16/18;(IPC1-7):C23C16/18;C07C53/18;C07C53/124;C07C13/263;C07C11/12 |
主分类号 |
C07C51/00 |
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