发明名称 ANTIREFLECTION FILM
摘要 <P>PROBLEM TO BE SOLVED: To provide an antireflection film whose hardness is improved by surface treatment of a metal oxide layer which constitutes the uppermost layer of the antireflection film with plasma discharge at a pressure close to the atmospheric pressure after having deposited the metal oxide layer. <P>SOLUTION: The metal oxide layer positioned as the uppermost layer of the antireflection film consisting of a single layer metal oxide layer or two or more metal oxide layers on the substrate is surface-treated with plasma discharge in a mixed gas atmosphere at a pressure close to the atmospheric pressure. <P>COPYRIGHT: (C)2004,JPO
申请公布号 JP2004170523(A) 申请公布日期 2004.06.17
申请号 JP20020333889 申请日期 2002.11.18
申请人 SEKISUI CHEM CO LTD 发明人 NAKAMURA HIDE
分类号 G02B1/11;B32B9/00 主分类号 G02B1/11
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