摘要 |
A light emitting device includes a substrate, a textured layer overlying the substrate, at least one III-nitride layer overlying the textured layer, and a substantially planar light emitting region. Devices incorporating scattering layers may be formed by several different methods. In a first method, an epitaxial layer is deposited then etched to form the textured layer. In a second method, a photomask is deposited and patterned to create openings in the photomask. The textured layer is then preferentially deposited in the openings formed in the photomask. In a third method, the textured layer is deposited under conditions that favor three-dimensional growth, then optionally annealed.
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