发明名称 DRY ETCHING SYSTEM
摘要 <P>PROBLEM TO BE SOLVED: To adjust the height and tilt of a bottom electrode 16 so that the bottom electrode 16 and a top electrode 20 may be parallel to each other and a distance between these two electrodes may be a specified value in a short time (in seconds) without opening a reaction chamber 11 to the atmosphere. <P>SOLUTION: In a dry etching system 10, the bottom electrode 16 is supported by three or more supporting points connected to three or more motors 17A, 17B, and 17C. A range meter 19A, 19B, and 19C for measuring a distance between the bottom electrode 16 and the top electrode 20 is assembled in the bottom electrode 16. <P>COPYRIGHT: (C)2004,JPO
申请公布号 JP2004172243(A) 申请公布日期 2004.06.17
申请号 JP20020334449 申请日期 2002.11.19
申请人 NEC KANSAI LTD 发明人 ISHIDA ATSUSHI
分类号 H05H1/46;H01L21/3065 主分类号 H05H1/46
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