ANTI-REFLECTIVE COATING COMPOSITIONS FOR USE WITH LOW k DIELECTRIC MATERIALS
摘要
Anti-reflective compositions and methods of using those compositions with low dielectric constant materials are provided. In one embodiment, the compositions include polymers comprising recurring monomers having unreacted epoxide groups. In another embodiment, the polymers further comprise recurring monomers comprising epoxide rings reacted with a light attenuating compound so as to open the ring. The compositions can be applied to dielectric layers so as to minimize or prevent reflection during the dual damascene process while simultaneously blocking via or photoresist poisoning which commonly occurs when organic anti-reflective coatings are applied to low dielectric constant layers.
申请公布号
WO02099531(A3)
申请公布日期
2004.06.17
申请号
WO2002US15694
申请日期
2002.05.14
申请人
BREWER SCIENCE, INC.
发明人
PULIGADDA, RAMA;LAMB, JAMES, E., III;FLAIM, TONY, D.;HUANG, RUNHUI;SHAO, XIE