| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for producing high-purity titanium suitable for a sputtering target by efficiently separating impurities from sponge titanium. SOLUTION: The production method comprises the step of forming massive sponge titanium by reducing titanium tetrachloride with metallic magnesium, the step of disintegrating the massive sponge titanium into granular sponge titanium with an average granule size of 2-50 mm, and the step of treating the granular sponge titanium with an acid. COPYRIGHT: (C)2004,JPO
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