发明名称 FABRICATION OF SUB-WAVELENGTH STRUCTURES
摘要 A method for the manufacture of sub-wavelength structures on substrates is provided, wherein a deformable photoresist is arranged on a substrate. A hydrophilic stamp (made of a material having a higher refractive index than the photoresist) is used to imprint wave guiding structures into the deformable photoresist. Light is coupled into the wave guiding structures to create evanescent waves to expose the photoresist. By imprinting critical dimensions on the substrate and subsequently exposing the resist by means of optical structures integrated in the stamp, those critical dimensions can be further reduced.
申请公布号 US2004115568(A1) 申请公布日期 2004.06.17
申请号 US20030707451 申请日期 2003.12.15
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 SCHMIDT MARKUS
分类号 G03F7/004;G02B6/24;G03F1/14;G03F7/00;G03F7/20;G11B5/84;H01L21/027;(IPC1-7):G03F7/20 主分类号 G03F7/004
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