发明名称 |
Ion-beam deposition process for manufacturing multi-layered attenuated phase shift photomask blanks |
摘要 |
A single ion-beam deposition, or a dual ion-beam deposition process for fabricating attenuating phase shift photomask blanks capable of producing a phase shift of 180° and having an optical transmissivity of at least 0.001 at selected lithographic wavelengths <400 nm, comprising at least one layer of an optically transmitting and/or one layer of optically absorbing elemental or a compound material in a periodic or an aperiodic arrangement.
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申请公布号 |
US2004115343(A1) |
申请公布日期 |
2004.06.17 |
申请号 |
US20030473698 |
申请日期 |
2003.09.29 |
申请人 |
CARCIA PETER FRANCIS;DIEU LAURENT |
发明人 |
CARCIA PETER FRANCIS;DIEU LAURENT |
分类号 |
C23C14/00;C23C14/06;C23C14/46;G03F1/00;G03F1/08;(IPC1-7):B05B5/00 |
主分类号 |
C23C14/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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