WAFER TRACK APPARATUS AND METHODS FOR DISPENSING FLUIDS WITH ROTATABLE DISPENSE ARMS

摘要

Methods and apparatus for controllably dispensing fluids within wafer track modules using rotatable liquid dispense arms and nozzles. The fluid dispense apparatus may be specifically selected for developing a photoresist-coated substrate. A series of one or more rotatable arms can be mounted adjacent to a mounted substrate within a develop module, wherein each arm supports a dispense nozzle that is connected to a fluid source. The dispense nozzle may be formed with a plurality of nozzle tips for dispensing selected developer and rinse fluids. Each rotatable arm can be configured to rotate about its longitudinal axis to selectively position the dispense nozzle between various dispense positions and non-dispense positions to reduce risk of dripping solution onto the substrate. Methods for developing photoresist-coated semiconductor wafers are also provided herein using developer and rinse fluid dispense apparatus with a dispense arm that is rotatable about its longitudinal axis. While in a dispense position, the arm or nozzle itself can be rotated so as to direct nozzle tips towards a wafer surface which facilitates fluid dispense onto the surface. While in the non-dispense position, the nozzle tips may be directed away from the wafer surface to reduce the likelihood of any undesired drips falling thereon.