| 发明名称 |
Heat treating device |
| 摘要 |
A antireflective film 50 is formed on a thermocouple 42 arranged in a processing vessel 1 of a heat treatment apparatus in order to improve the transient response characteristics of the thermocouple 42. In a typical embodiment, the thermocouple 42 is made by connecting a platinum wire 43A and a platinum-rhodium alloy wire 43B, and the antireflective film 50 is composed by stacking a silicon nitride layer 50C, silicon layer 50B and a silicon nitride layer 50A in that order.
|
| 申请公布号 |
US2004115585(A1) |
申请公布日期 |
2004.06.17 |
| 申请号 |
US20030473248 |
申请日期 |
2003.09.29 |
| 申请人 |
MAKIYA TOSHIYUKI;SAITO TAKANORI;EICKMANN KARUKI;KAUSHAI SANJEEV;DIP ANTHONY;O'MEARA DAVID L. |
发明人 |
MAKIYA TOSHIYUKI;SAITO TAKANORI;EICKMANN KARUKI;KAUSHAI SANJEEV;DIP ANTHONY;O'MEARA DAVID L. |
| 分类号 |
G01K7/02;C23C16/46;G01K1/20;G01K7/04;H01L21/22;H01L21/31;(IPC1-7):F27D1/00 |
主分类号 |
G01K7/02 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
