发明名称 |
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME FOR RESTRAINING IMPURITIES FROM OUT-DIFFUSING |
摘要 |
PURPOSE: A semiconductor device and a method of manufacturing the same are provided to restrain impurities from out-diffusing by distributing non-uniformly the impurities over an isolation layer. CONSTITUTION: A semiconductor device includes an isolation layer filled in a groove of a substrate. The isolation layer contains predetermined impurities. The concentration of the impurities is gradually decreased from bottom to top in the isolation layer, so that out-diffusion of the impurities is restrained.
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申请公布号 |
KR20040050826(A) |
申请公布日期 |
2004.06.17 |
申请号 |
KR20030050235 |
申请日期 |
2003.07.22 |
申请人 |
RENESAS TECHNOLOGY CORP. |
发明人 |
KITAZAWA MASASHI;KUROI TAKASHI |
分类号 |
H01L21/76;H01L21/762;(IPC1-7):H01L21/76 |
主分类号 |
H01L21/76 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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