APPARATUS FOR VACUUM AND ITS MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To provide an apparatus for vacuum which has low gas discharging speed even if it is exposed to a vacuum environment and is capable of facilitating reach to a high-vacuum range. SOLUTION: This apparatus for vacuum is at least partially constituted of resin against vacuum. At least a partial surface of the resin is covered with inorganic film. The inorganic film melts the surface. Alumina is used as the inorganic film and its surface roughness may be≤3μm. The surface of the inorganic film may be irradiated with laser for melting. COPYRIGHT: (C)2004,JPO