发明名称 METHOD OF MANUFACTURING INTERCONNECTING LINE OF LAMINATED STRUCTURE
摘要 PROBLEM TO BE SOLVED: To enable a laminated film, which is composed of a low-resistance core metal film sandwiched between an upper high-melting point metal film and a lower high-melting point metal film, to be improved in heat-resistant and corrosion-resistant properties at the same time. SOLUTION: A low-resistance interconnecting line of laminated structure is composed of low-resistance core metal films 72 and 82 sandwiched between lower high-melting point metal films 71 and 81 and upper high-melting point metal films 74 and 84. The top surfaces, under surfaces and side walls of the low-resistance core metal films are thin coated with the oxide film, nitride film, or oxide nitride films 73 and 83 of the low-resistance core metal. In this case, the oxide film, nitride film, or oxide nitride films 73 and 83 of the low-resistance core metal covering the top surfaces, under surfaces and side walls of the low-resistance core metal films may be set different from each other. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004172150(A) 申请公布日期 2004.06.17
申请号 JP20020332485 申请日期 2002.11.15
申请人 NEC KAGOSHIMA LTD 发明人 DOI SATOSHI
分类号 H01L23/52;H01L21/28;H01L21/3205;H01L21/336;H01L29/417;H01L29/45;H01L29/49;H01L29/786;(IPC1-7):H01L21/320 主分类号 H01L23/52
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