发明名称 HARD FILM
摘要 PROBLEM TO BE SOLVED: To provide a hard film in which the adhesion, high temperature oxidation resistance and wear resistance of an (AlCr)N based film are improved, and which has high hardness in particular. SOLUTION: The hard film is formed by an arc-discharge ion-plating method, and has a composition represented by (Al<SB>x</SB>Cr<SB>1-x</SB>)(N<SB>1-α-β-γ</SB>B<SB>α</SB>C<SB>β</SB>O<SB>γ</SB>), wherein x,α,βandγare respectively atomic ratios meeting 0.45<X<0.75, 0≤α<0.12, 0≤β<0.20, and 0.01≤γ≤0.25, has the highest diffraction intensity in X-ray diffraction at a (200) face or a (111) face, and has bond energy of at least Cr and/or Al with oxygen in the range of 525 to 535 eV in X-ray photoelectron spectroscopic analysis. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004169076(A) 申请公布日期 2004.06.17
申请号 JP20020334434 申请日期 2002.11.19
申请人 HITACHI TOOL ENGINEERING LTD 发明人 ISHIKAWA TAKASHI
分类号 C23C14/06;B23B27/14;(IPC1-7):C23C14/06 主分类号 C23C14/06
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